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For Sale - Frontend |
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Asher |
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- Axcelis/Fusion Gemini Photostabilizer GPS UV Curing System |
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- Gasonics 9104 Plasma Asher, 6" |
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CVD Systems |
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- AMAT Centura EMAX CT+, 300 mm |
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- AMAT Centura EMXP Oxide Plus, 6" |
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- AMAT Centura EPI Chambers, 300 mm |
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- AMAT Centura 5200 DPS Metal Etcher, 8" |
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- AMAT P5000 CVD, 6" |
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- AMAT Producer, 12" |
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- ASM 412 Dual ATM Oxide (Dry Oxide), 12" |
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- ASM 412 Nitride Dual Reactor, 12" |
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- ASM 412 Vertical LPCVD Furnace (Poly), 12" |
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- ASM 412 Vertical LPCVD Furnace (Niride), 12" |
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- ASM A400 Furnace Single Reactor, 8" |
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- ASM Eagle-12 Rapidfire PECVD (Chemical Vapor Deposition), 12" |
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- ASM Epsilon E2000 Plus Epitaxy Tool |
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- Kokusai DJ-833 V Furnace, 8" |
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- Oxford Plasmalab 100 PECVD TEOS System, up to 200 mm |
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- Oxford Plasmalab 133 RIE Reactive Ion Etching System |
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- STS Multiplex CVD 100mm |
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- UNAXIS CLC200 PVD Sputter |
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- Varian 3290 Sputtering System, 6" |
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- AMAT Centura EMAX CT+, 300 mm |
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Etcher |
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- Alcatel AMS 4200 Plasma DRIE Etch Equipment |
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- Semitool SST F42120F Solvent Chemical Stripping Resist Remover, 6'' |
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Furnaces |
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- TEL Alpha-8 SEi High Temperature Pyrogenic Vertical Furnace, 8" |
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Implanter |
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- Varian 350 D Ion Implanter, 6" |
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- Varian E500 EHP Ion Implanter, 8" |
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- Varian Kestrel II 750 High Energy Implanter, 8" |
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Laser |
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- ESI 5330Xi Laser |
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Metrology |
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- Bio-Rad QS 408M Manual FTIR Spectrometer, up to 8" |
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- Bio-Rad QS 1200 Automated FTIR Spectrometer, up to 8" |
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- Bruker Dimension Icon DMFASTSCAN2 |
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- KLA-Tencor ASET F 5x Thin Film Measurement System, 8" |
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- KLA-Tencor Candela CS 10 R Surface Analyzer |
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- KLA-Tencor OmniMap RS 100 Mapping System |
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- KLA-Tencor P10 Profiler |
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- KLA-Tencor P20H Profiler |
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- Nikon Nexiv VMZ R 6555 Video Measuring System |
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- Veeco Dektak 8 Profilometer |
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- Veeco Dektak 3ST Auto 1 Wafer Profiler |
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- Veeco VX 200 Atomic Force Profiler |
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Pumps |
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- CTI-Cryogenics ON-BOARD 8F Cryopump |
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Wafer Bonder |
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- SUSS Microtec MA200 Wafer Bonder |
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- SUSS Microtec SB6 Wafer Bonder |
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Wafer Cleaning |
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- DNS 80BW-AR Spin Scrubber, 8" |
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- DNS 80A Spin Scrubber, 8" |
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- Dainippon (DNS) WS 820 L Wafer Scrubber, 8" |
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- TEL Expedius+ Wafer Cleaning, 12" |
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Wafer Coater / Developer |
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- C&D Semiconductor Smart Pro P 9000 Cluster System |
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- Intellivation R 2 R 500 E Vacuum Web Coating System |
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- Suss Microtec Falcon Coater / Developer, 4" - 8" |
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- Suss Microtec ACS200 / Falcon 3x Coater, 4" - 8" |
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- Suss Microtec ACS200 / Falcon 4x Developer, 4" - 8" |
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- Suss Microtec ACS300 4x Developer, 8",12" |
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Wafer Grinder / Polisher |
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- DISCO DGP8761 + DFM2800 Automatic Grinder, 12" |
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Wafer Inspection / Measurement |
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- KLA Tencor 4500 Surfscan Wafer Inspection, 3" - 6 " |
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- KLA Tencor 5500 Surfscan Wafer Inspection, 8" |
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- KLA Tencor 6200 Surfscan Wafer Inspection, 8" |
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- KLA Tencor 6220 Surfscan Wafer Inspection, 8" |
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- KLA Tencor 6400 Surfscan Wafer Inspection, 8" |
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- KLA Tencor 6420 Surfscan Wafer Inspection, 8" |
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- KLA Tencor 8100 CD-SEM Measurement System, 8" |
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- KLA Tencor AIT II Surfscan Wafer Inspection, 8" |
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- KLA-Tencor Candela C 20 Surface Inspection System |
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- KLA-Tencor Candela CS 900 Surface Analyzer |
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- KLA Tencor SP1 TBi Wafer Inspection System, 8" to 12" |
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- KLA Tencor UV-1050 Thin Film Measurement System, 8" |
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- Nikon Optistation 3100 Wafer Inspection System |
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Wafer Mask Alignment |
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- Karl Suss MA6 / BA6 Mask Aligner, 150mm |
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- Zygo 4386A-2 Mask Metrology System |
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Wafer Stepper |
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- ASML Twinscan AT 1200 B Scanner |
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- Nikon NSR-2005 i10 C Stepper |
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- Nikon NSR-2205 i11D i-Line Wafer Stepper, 6", reticle 6" |
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- Nikon NSR 2205 i12D Stepper, 8", reticle 5" |
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- Nikon NSR-2205 EX14 Wafer Stepper, 8" |
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- Nikon NSR S208D Stepper, 12" |
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- Nikon NSR-S204B DUV Scanner, 8" |
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Wet Process |
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- FEI Helios Nanolab 400 |
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- SEZ DV-Prime Single-Wafer Wet Processor, 8 chambers, 12" |
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- SEZ DV34 Single-Wafer Wet Processor, 4 chambers, 8", 12" |
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- SEZ RST 201 Single-Wafer Wet Processor, 1 chamber, 6" |
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- SEZ 303 Single-Wafer Wet Processor |
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- SEZ RST 303 Single-Wafer Wet Processor, 1 chamber, 12" |
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- SEZ RST 304 Single-Wafer Wet Processor, 1 chamber, 8", 12" |
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- SEZ 304 Single-Wafer Wet Processor, 1 chamber, 8", 12" |
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- SEZ 305 Single-Wafer Wet Processor, 1 chamber, 8", 12" |
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- SEZ 323 Single-Wafer Wet Processor, 2 chambers, 8", 12" |
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- SEZ ES34 Single-Wafer Wet Processor, 4 chambers, 8", 12" |
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