| For Sale - Frontend |
| Asher |
| - Alcan Tech / Canon MAS-8000 Microwave Asher |
| - Axcelis Fusion 150 PC System, 6" |
| - Axcelis Fusion 200 ACU System, 8" |
| - Axcelis Fusion PS3 UV Photo Stabilizer, 8" / 12" |
| - Branson 91391 Quartz Barrel Plasma Etcher |
| - Kokusai Electric RM 6500 R Plasma Asher |
| - Mattson Aspen II - parts machine |
| CVD / PVD Systems |
| - Aixtron Crius II MOCVD 2" x 55 |
| - Aixtron G3 HT MOCVD 4" x 8 |
| - Aixtron G4 MOCVD for Epi growth for SiC |
| - AMAT AKT 1600 PECVD System, flat panel size 320 x 352 mm |
| - AMAT Centura EPI Chambers, 300 mm |
| - AMAT Endura P5000 Mk II TEOS, 8" |
| - AMAT P5000, 6" |
| - AMAT P5000, 8" |
| - ASM Epsilon 3200 EPI Deposition System, 12" |
| - Kokusai DD-812 Vertical Furnace, 8" |
| - Kokusai DD-853 V Vertical Furnace, 6" and 8" |
| - Kokusai DD-9200 GH Furnace, 8" |
| - Kokusai DJ-1206VN-DM Vertical Furnace, 300mm, LPCVD Nitride |
| - Kokusai DJ-813 LPCVD Furnace, 8" |
| - Kokusai DJ-833V Furnace, 8" |
| - Kokusai DJ-853V Furnace, 6" and 8" |
| - MATHESON UR25K429 Gallium Nitride MOCVD System (6" x 7) |
| - Novellus Concept-1 System, 6", TEOS |
| - Novellus Concept-1 System, 8" |
| - Novellus Concept-1 CVD-W, Tungsten, 8" |
| - Novellus Concept-3 Speed, 3 chambers, 12" |
| - Oxford Ionfab 300 Plus Ion Beam Etch and Deposition System, 8" |
| - Oxford PlasmaPro 800Plus RIE Etcher |
| - Plasma-Therm LLC SLR-770B Deep Reactive Ion Etcher |
| - Sencera 6 Target In-line Sputter, 1.6 x 1.4 meter substrate processing equipment |
| - Veeco E300 MOCVD System |
| - Veeco E400 MOCVD System |
| - Veeco Gen II MBE System |
| - Veeco K475 GaN MOCVD System |
| - Veeco K475i MOCVD Upgrade Kit |
| - Veeco Spector Ion Beam Sputtering System |
| - Watkins-Johnson WJ999 CVD System, 8" |
| Etcher |
| - Alcatel AMS 4200 Plasma DRIE Etch Equipment |
| - LAM 2300 Kiyo Metal Etch, 12" |
| - LAM TCP 9400 SE Etch System, 8" |
| - March Instruments AP-1000 Plasma Cleaner |
| - March Instruments PX-1000 Plasma Etcher |
| - PVA TePla PS80 Plus Microwave Plasma Cleaner |
| - Samco PC 1100 Photoresist Stripper Asher |
| - Semitool SST 742 Polymer Remover |
| - SEZ 203 Spin Etcher, 6" to 8" |
| - SEZ 223 Spin Etcher, 4" to 8" |
| - SEZ 323 Spin Etcher, 12" |
| - SEZ spares - please ask ! |
| - ULVAC NE-950EX-V CCP Etcher, 2" to 12" |
| Evaporation and Sputtering Systems |
| - Balzers LLS-801 Metal Sputter System |
| - Balzers LLS-802 Metal Sputter System |
| - Balzers LLS EVO Sputter System |
| - CHA Mark 40 E-Beam Evaporator |
| - HANIL VACUUM HVC-2050DA High Vacuum Box Coater |
| - Varian 3290 STQ Sputtering System |
| Furnaces |
| - Aviza RVP 9000 Furnace, 8" |
| - Kokusai / Bruce BDF-200 LPCVD Furnace, 8" |
| - Kokusai DJ-813 LPCVD Furnace, 8" |
| - Kokusai DD-812 Vertical Furnace, 8" |
| - Kokusai Quixace II ALD / SiO2 Vertical Furnace, 12" |
| - SST 5100 Programmable Vacuum/Pressure Soldering Furnace |
| - TEL Alpha 8S Furnace, 8" |
| - TEL Alpha-8SE-E Vertical FTP LTO/Nitride Furnace, 8" |
| - TEL Alpha 8S-Z Furnace, 8" |
| - Ulvac V8-100 Furnace |
| Implanter |
| - Axcelis 10-160 Ion Implanter, 4" / 6" |
| - Axcelis / Fusion HE 3 High Energy Implanter, 12" |
| - Axcelis NV 8200 P MS Implanter, 8" |
| - Axcelis Paradigma XE Ion Implanter, 12" |
| - Nissin Exceed 2000 A Ion Implanter, 8" |
| - Varian E220 Medium Current Ion Implanter, 6" |
| - Varian 350 D Ion Implanter, 6" |
| - Varian E500 HP Ion Implanter, 8" |
| - Varian VIISion 80 + HS 31 Ion Implanter, 8" |
| Laser |
| - ESI 44 Laser Trimming System |
| - ESI 2100 Laser Trimming System |
| - ESI 9350 Laser Processing System |
| - ESI 9825 Laser Processing System, 8" and 12" |
| - Laser Quantum finesse pure Continuous Wave Laser System |
| Metrology |
| - Bio-Rad QS 408M Manual FTIR Spectrometer, up to 8" |
| - Cyberscan CT350T Dual Non-Contact Double-Sided Optical Profilometer |
| - Nanometrics NanoSpec 6100 Thickness Measurement System, 12" |
| - Rudolph MP200 Wafer Inspection System, 6" to 8" |
| - Veeco/Bruker Contour GT-K Optical Profilometer |
| - Veeco Dektak 8 Profilometer |
| Photolithography |
| - Fusion Gemini GPS Photostabilizer, 8" |
| Pumps |
| - Adixen A100L Pump |
| - Adixen A100P Pump |
| - Adixen ADS602P Pump |
| - Adixen ADP122P Pump |
| - Adixen ADS602P Pump |
| - Adixen ADS1202 Pump |
| - Adixen ATH 500M Turbo Pump |
| - Alcatel ADP122 Dry Pump |
| - Alcatel ADS602 Dry Pump |
| - Alcatel ADS1202 Dry Pump |
| - Ebara A10S Dry Pump |
| - Ebara AA10 Dry Pump |
| - Ebara A30W Dry Pump |
| - Ebara AA40W Dry Pump |
| - Ebara A70W Dry Pump |
| - Ebara AA70W Dry Pump |
| - Ebara AAS70W Dry Pump |
| - Ebara A150W Dry Pump |
| - Ebara ESR20N Dry Pump |
| - Edwards iH80 Mk5 Dry Vacuum Pump |
| - Edwards iH600 Mk5 Dry Vacuum Pump |
| - Edwards iH1000 Mk5 Dry Vacuum Pump |
| - Edwards iH1800 Mk5 Dry Vacuum Pump |
| - Edwards iF1800 Dry Vacuum Pump |
| - Edwards iH1800 Dry Vacuum Pump |
| - Edwards iQDP80 Dry Vacuum Pump |
| - Edwards iXH3030T Dry Vacuum Pump |
| - Edwards iXH3045H Dry Vacuum Pump |
| - Edwards STP-A1603C Turbomolecular Pump |
| - Edwards ESDP12 Scroll Pump |
| - Edwards XDS 10i Scroll Pump |
| - Kashiyama MU100 Dry Pump |
| - Leybold D65BCS Vacuum Pump |
| - Leybold SP630F Vacuum Pump |
| - Leybold TURBOVAC 1100C Turbo Pump |
| - Seiko Seiki STP1303 Turbo Pump |
| - Varian SH-110 Scroll Pump |
| Wafer Cleaning |
| - DNS SS-W80B-AR Scrubber, 8" |
| - DNS SU-3100 Single Wafer Cleaner, 12" |
| - TEL / FSI Antares Aerosol Cleaner, 12" |
| - TEL / FSI Aries Wafer Cleaner, 8" |
| Wafer Coater / Developer |
| - DNS 80B Track Interface for Nikon Stepper |
| - DNS SK-W80A-BVP Coater / Developer |
| - SVG 90 S ASML Coater / Developer Track System, 2C2D, 6" |
| - TEL Mark V 1C / 2D Track, 4" |
| - TEL Mark Vz 1C / 2D Track, 6" |
| - TEL Act M Coater |
| - TEL Act M Developer |
| Wafer Grinder / Polisher |
| - DISCO DAG810 Backside Grinder, 8" |
| - DISCO DFS-8910 Surface Planer, 12" |
| - DISCO DGP-8760 + DFM-2700 Grinder/Polisher, 12" |
| - Peter Wolters AC1200 F 2-wheel Fine Grinding Machine |
| - Peter Wolters AC1200 L 2-wheel Lapping Machine |
| - Peter Wolters AC1200 P 2-wheel Polishing Machine |
| Wafer Inspection / Measurement |
| - KLA Tencor 2132 Wafer Inspection System, 8" |
| - KLA Tencor 5500 Surfscan Wafer Inspection, 8" |
| - KLA Tencor 6220 Surfscan Wafer Inspection, 8" |
| - KLA Tencor 6400 Surfscan Wafer Inspection, 8" |
| - KLA Tencor 6420 Surfscan Wafer Inspection, 8" |
| - KLA Tencor Candela CS20 Optical Surface Analyzer |
| - KLA Tencor SP1 Classic Wafer Inspection System, 6" to 8" |
| Wafer Mask Alignment |
| - Canon MPA 600 FA Mask Aligner, 6" |
| - EVG 420 Mask Aligner, 4" |
| - EVG 6200 Infinity Mask Aligner, 8" |
| - Karl Suss MJB3 Mask Aligner, 3" |
| Wafer Stepper |
| - Nikon NSR-1505G4D Stepper, 6" |
| - Nikon NSR-2005 i11C i-Line Wafer Stepper, 6", reticle 5" |
| - Nikon NSR-2205 i11D i-Line Wafer Stepper, 6", reticle 6" |
| - Nikon NSR-2205 i11D i-Line Wafer Stepper, 8", reticle 6" |
| - Nikon NSR-2205 i12D i-Line Wafer Stepper, 6", reticle 6" |
| - Nikon NSR-2205 i12D i-Line Wafer Stepper, 8", reticle 6" |
| - Nikon NSR-S204B KrF Scanner, 8" |
| - Nikon NSR-S205 Scanner, 12" |
| - Nikon NSR-S207D Scanner, 12" |
| - Nikon NSR-S609B Scanner, 12" |
| - Nikon NSR-SF100 Polyimide Exposure System, 12" |
| - Nikon S609B Immersion Scanner, 12" |